magnetron sputtering
常见例句
- Deposition rate is an important parameter in magnetron sputtering and influenced by many factors.
沉积速率是磁控溅射镀膜技术中的一项重要指标，它由许多因素决定。 - The thickness uniformity of films deposited by planar magnetron sputtering target was analyzed theoretically.
从理论上分析了平面磁控溅射靶沉积薄膜的厚度均匀性。 - The development, principle and applications of magnetron sputtering technique are introduced in this paper.
该文介绍了磁控溅射沉积技术的基本原理、发展及应用。 返回 magnetron sputtering